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Produktwelt
Negativ-Photoresiste
UV-Lithographie (Breitband und i-Linen-Belichtung)
Elektronenstrahl-/ Tief-UV-Lithographie
Laserdirektschreiben @ 405 nm
Prozesschemikalien
FAQ
Positiv-Photoresiste
UV-Lithographie
Grauton-Lithographie
E-Beam Lithographie
Prozesschemikalien
FAQ
Hybrid Polymers
UV-Lithographie
UV Imprint/ UV Moulding
Herstellung Polymerer Arbeitsstempel
Ink-Jet Printing
Prozesschemikalien
FAQ
Nanoimprint-Resiste
Thermische Nanoimprint-Lithographie
Kombinierte thermische- und Photo-Nanoimprint-Lithographie
Photo-Nanoimprint-Lithographie
Herstellung Polymerer Arbeitsstempel
Prozesschemikalien
FAQ
Produkte anderer Hersteller
DOW Electronic Materials
MicroChem Corp. Produkte
DuPont Trockenfilmresiste
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3D Mikrostrukturen
ma-P 1200G
Positiv-Photoresiste
Details
‣
ma-P 1200
Positiv-Photoresiste
Details
‣
ma-P 1275, ma-P 1275HV
Positiv-Photoresiste
Details
‣
OrmoComp®
Hybrid Polymers
Details
‣
InkOrmo
Hybrid Polymers
Details
‣
OrmoStamp®
Hybrid Polymers
Details
‣
OrmoStamp®
Nanoimprint-Resiste
Details
‣
UV-curable liquid silicone rubber / UV-PDMS
Nanoimprint-Resiste
Details
‣
Thermischer Reflow
ma-P 1200G
Positiv-Photoresiste
Details
‣
ma-P 1200
Positiv-Photoresiste
Details
‣
mr-I 7000R Serie
Nanoimprint-Resiste
Details
‣
mr-I 8000R Serie
Nanoimprint-Resiste
Details
‣
mr-I T85 series
Nanoimprint-Resiste
Details
‣
mr-I PMMA35k series
Nanoimprint-Resiste
Details
‣
UV Lithographie
ma-P 1200G
Positiv-Photoresiste
Details
‣
ma-P 1200
Positiv-Photoresiste
Details
‣
ma-P 1275, ma-P 1275HV
Positiv-Photoresiste
Details
‣
EpoCore & EpoClad Serien
Negativ-Photoresiste
Details
‣
OrmoComp®
Hybrid Polymers
Details
‣
OrmoClear® Series
Hybrid Polymers
Details
‣
OrmoCore and OrmoClad
Hybrid Polymers
Details
‣
OrmoStamp®
Hybrid Polymers
Details
‣
ma-N 400 & ma-N 1400 series
Negativ-Photoresiste
Details
‣
OrmoStamp®
Nanoimprint-Resiste
Details
‣
OrmoClear®FX
Hybrid Polymers
Details
‣
Grauton Lithographie
ma-P 1200G
Positiv-Photoresiste
Details
‣
Laser-Direct-Writing Lithographie
ma-P 1200G
Positiv-Photoresiste
Details
‣
mr-DWL series
Negativ-Photoresiste
Details
‣
Leuchtdioden (LED)
ma-P 1200
Positiv-Photoresiste
Details
‣
mr-I 7000R Serie
Nanoimprint-Resiste
Details
‣
mr-I 8000R Serie
Nanoimprint-Resiste
Details
‣
SIPOL series
Nanoimprint-Resiste
Details
‣
mr-I 9000M series
Nanoimprint-Resiste
Details
‣
mr-NIL 6000E series
Nanoimprint-Resiste
Details
‣
ma-N 400 & ma-N 1400 series
Negativ-Photoresiste
Details
‣
UV-curable liquid silicone rubber / UV-PDMS
Nanoimprint-Resiste
Details
‣
mr-NIL210 series
Nanoimprint-Resiste
Details
‣
Halbleiter-Bauelemente
ma-P 1200
Positiv-Photoresiste
Details
‣
ma-N 2400 & mr-EBL 6000 series
Negativ-Photoresiste
Details
‣
mr-I 9000M series
Nanoimprint-Resiste
Details
‣
mr-NIL 6000E series
Nanoimprint-Resiste
Details
‣
mr-UVCur21 series
Nanoimprint-Resiste
Details
‣
ma-N 400 & ma-N 1400 series
Negativ-Photoresiste
Details
‣
mr-NIL210 series
Nanoimprint-Resiste
Details
‣
Trockenätzen (Ätzmaskierung für Halbleiter und Metalle)
ma-P 1200
Positiv-Photoresiste
Details
‣
ma-N 2400 & mr-EBL 6000 series
Negativ-Photoresiste
Details
‣
mr-I 7000R Serie
Nanoimprint-Resiste
Details
‣
mr-I 8000R Serie
Nanoimprint-Resiste
Details
‣
mr-I T85 series
Nanoimprint-Resiste
Details
‣
mr-I 9000M series
Nanoimprint-Resiste
Details
‣
mr-NIL 6000E series
Nanoimprint-Resiste
Details
‣
mr-UVCur21 series
Nanoimprint-Resiste
Details
‣
ma-N 400 & ma-N 1400 series
Negativ-Photoresiste
Details
‣
mr-NIL210 series
Nanoimprint-Resiste
Details
‣
mr-UVCur26SF
Nanoimprint-Resiste
Details
‣
mr-PosEBR series
Positiv-Photoresiste
Details
‣
Galvanoformen
ma-P 1200
Positiv-Photoresiste
Details
‣
ma-P 1275, ma-P 1275HV
Positiv-Photoresiste
Details
‣
mr-DWL series
Negativ-Photoresiste
Details
‣
High-Aspect-Ratio Strukturen
mr-DWL series
Negativ-Photoresiste
Details
‣
SIPOL series
Nanoimprint-Resiste
Details
‣
mr-UVCur21 series
Nanoimprint-Resiste
Details
‣
mr-NIL210 series
Nanoimprint-Resiste
Details
‣
Zwei-Photonen-Absorption Lithographie
mr-DWL series
Negativ-Photoresiste
Details
‣
OrmoComp®
Hybrid Polymers
Details
‣
Nano- und Mikroelektronik
ma-N 2400 & mr-EBL 6000 series
Negativ-Photoresiste
Details
‣
mr-I 9000M series
Nanoimprint-Resiste
Details
‣
mr-NIL 6000E series
Nanoimprint-Resiste
Details
‣
mr-UVCur21 series
Nanoimprint-Resiste
Details
‣
UV-curable liquid silicone rubber / UV-PDMS
Nanoimprint-Resiste
Details
‣
mr-NIL210 series
Nanoimprint-Resiste
Details
‣
mr-UVCur26SF
Nanoimprint-Resiste
Details
‣
mr-PosEBR series
Positiv-Photoresiste
Details
‣
Wire-Grid Polarisatoren
ma-N 2400 & mr-EBL 6000 series
Negativ-Photoresiste
Details
‣
mr-I 7000R Serie
Nanoimprint-Resiste
Details
‣
mr-I 8000R Serie
Nanoimprint-Resiste
Details
‣
SIPOL series
Nanoimprint-Resiste
Details
‣
mr-I 9000M series
Nanoimprint-Resiste
Details
‣
mr-NIL 6000E series
Nanoimprint-Resiste
Details
‣
mr-UVCur21 series
Nanoimprint-Resiste
Details
‣
mr-UVCur26SF
Nanoimprint-Resiste
Details
‣
Deep-UV Lithographie
ma-N 2400 & mr-EBL 6000 series
Negativ-Photoresiste
Details
‣
Elektronenstrahl-Lithographie
ma-N 2400 & mr-EBL 6000 series
Negativ-Photoresiste
Details
‣
mr-PosEBR series
Positiv-Photoresiste
Details
‣
Optische Wellenleiter
EpoCore & EpoClad Serien
Negativ-Photoresiste
Details
‣
OrmoCore and OrmoClad
Hybrid Polymers
Details
‣
Diffraktive optische Elemente (DOE)
mr-I 7000R Serie
Nanoimprint-Resiste
Details
‣
mr-I 8000R Serie
Nanoimprint-Resiste
Details
‣
mr-I T85 series
Nanoimprint-Resiste
Details
‣
mr-I 9000M series
Nanoimprint-Resiste
Details
‣
mr-XNIL26 series
Nanoimprint-Resiste
Details
‣
OrmoComp®
Hybrid Polymers
Details
‣
OrmoClear® Series
Hybrid Polymers
Details
‣
OrmoStamp®
Hybrid Polymers
Details
‣
OrmoStamp®
Nanoimprint-Resiste
Details
‣
UV-curable liquid silicone rubber / UV-PDMS
Nanoimprint-Resiste
Details
‣
mr-UVCur26SF
Nanoimprint-Resiste
Details
‣
OrmoClear®FX
Hybrid Polymers
Details
‣
Organische Elektronik
mr-I 7000R Serie
Nanoimprint-Resiste
Details
‣
mr-I 8000R Serie
Nanoimprint-Resiste
Details
‣
SIPOL series
Nanoimprint-Resiste
Details
‣
mr-I 9000M series
Nanoimprint-Resiste
Details
‣
mr-NIL 6000E series
Nanoimprint-Resiste
Details
‣
mr-UVCur21 series
Nanoimprint-Resiste
Details
‣
OrmoComp®
Hybrid Polymers
Details
‣
OrmoClear® Series
Hybrid Polymers
Details
‣
OrmoStamp®
Hybrid Polymers
Details
‣
OrmoStamp®
Nanoimprint-Resiste
Details
‣
UV-curable liquid silicone rubber / UV-PDMS
Nanoimprint-Resiste
Details
‣
mr-NIL210 series
Nanoimprint-Resiste
Details
‣
mr-UVCur26SF
Nanoimprint-Resiste
Details
‣
OrmoClear®FX
Hybrid Polymers
Details
‣
Nanoimprint Lithographie (thermisch) für Strukturübertragung
mr-I 7000R Serie
Nanoimprint-Resiste
Details
‣
mr-I 8000R Serie
Nanoimprint-Resiste
Details
‣
SIPOL series
Nanoimprint-Resiste
Details
‣
mr-I T85 series
Nanoimprint-Resiste
Details
‣
mr-I 9000M series
Nanoimprint-Resiste
Details
‣
mr-I PMMA35k series
Nanoimprint-Resiste
Details
‣
mr-NIL210 series
Nanoimprint-Resiste
Details
‣
mr-UVCur26SF
Nanoimprint-Resiste
Details
‣
PVD-Verfahren (physical vapour deposition)
mr-I 7000R Serie
Nanoimprint-Resiste
Details
‣
mr-I 9000M series
Nanoimprint-Resiste
Details
‣
mr-NIL 6000E series
Nanoimprint-Resiste
Details
‣
mr-UVCur21 series
Nanoimprint-Resiste
Details
‣
ma-N 400 & ma-N 1400 series
Negativ-Photoresiste
Details
‣
Strukturierte Saphir Substrate
SIPOL series
Nanoimprint-Resiste
Details
‣
mr-I 9000M series
Nanoimprint-Resiste
Details
‣
mr-NIL 6000E series
Nanoimprint-Resiste
Details
‣
mr-NIL210 series
Nanoimprint-Resiste
Details
‣
Lab-on-a-Chip
mr-I T85 series
Nanoimprint-Resiste
Details
‣
OrmoComp®
Hybrid Polymers
Details
‣
OrmoClear® Series
Hybrid Polymers
Details
‣
OrmoStamp®
Hybrid Polymers
Details
‣
OrmoStamp®
Nanoimprint-Resiste
Details
‣
UV-curable liquid silicone rubber / UV-PDMS
Nanoimprint-Resiste
Details
‣
OrmoClear®FX
Hybrid Polymers
Details
‣
Mikrofluidik und Mikro-Bio-Fluidik
mr-I T85 series
Nanoimprint-Resiste
Details
‣
OrmoComp®
Hybrid Polymers
Details
‣
OrmoClear® Series
Hybrid Polymers
Details
‣
OrmoStamp®
Hybrid Polymers
Details
‣
OrmoStamp®
Nanoimprint-Resiste
Details
‣
UV-curable liquid silicone rubber / UV-PDMS
Nanoimprint-Resiste
Details
‣
OrmoClear®FX
Hybrid Polymers
Details
‣
Nanoimprint Lithographie (thermisch) für Permanentanwendung
mr-I T85 series
Nanoimprint-Resiste
Details
‣
mr-I 9000M series
Nanoimprint-Resiste
Details
‣
mr-UVCur26SF
Nanoimprint-Resiste
Details
‣
Nanoimprint Lithographie – kombinierte thermische und UV-NIL
mr-NIL 6000E series
Nanoimprint-Resiste
Details
‣
Nanoimprint Lithographie (UV- oder Photo-NIL) für Strukturübertragung
mr-UVCur21 series
Nanoimprint-Resiste
Details
‣
mr-XNIL26 series
Nanoimprint-Resiste
Details
‣
Rolle-zu-Rolle Verfahren
mr-UVCur21 series
Nanoimprint-Resiste
Details
‣
mr-XNIL26 series
Nanoimprint-Resiste
Details
‣
mr-UVCur26SF
Nanoimprint-Resiste
Details
‣
Wafer-Level Optiken
OrmoComp®
Hybrid Polymers
Details
‣
OrmoClear® Series
Hybrid Polymers
Details
‣
OrmoClear®FX
Hybrid Polymers
Details
‣
Nanoimprint Lithographie (UV- oder Photo-NIL) für Permanentanwendung
OrmoComp®
Hybrid Polymers
Details
‣
OrmoClear® Series
Hybrid Polymers
Details
‣
OrmoStamp®
Hybrid Polymers
Details
‣
OrmoStamp®
Nanoimprint-Resiste
Details
‣
OrmoClear®FX
Hybrid Polymers
Details
‣
UV Replikation
OrmoComp®
Hybrid Polymers
Details
‣
OrmoClear® Series
Hybrid Polymers
Details
‣
OrmoCore and OrmoClad
Hybrid Polymers
Details
‣
OrmoStamp®
Hybrid Polymers
Details
‣
OrmoStamp®
Nanoimprint-Resiste
Details
‣
UV-curable liquid silicone rubber / UV-PDMS
Nanoimprint-Resiste
Details
‣
OrmoClear®FX
Hybrid Polymers
Details
‣
Inkjet-Printing
InkOrmo
Hybrid Polymers
Details
‣
mr-UVCur26SF
Nanoimprint-Resiste
Details
‣
Nanoimprint Arbeitsstempel
OrmoStamp®
Hybrid Polymers
Details
‣
OrmoStamp®
Nanoimprint-Resiste
Details
‣
UV-curable liquid silicone rubber / UV-PDMS
Nanoimprint-Resiste
Details
‣
Lift-off Strukturierung
ma-N 400 & ma-N 1400 series
Negativ-Photoresiste
Details
‣
Produktwelt
Negativ-Photoresiste
UV-Lithographie (Breitband und i-Linen-Belichtung)
Elektronenstrahl-/ Tief-UV-Lithographie
Laserdirektschreiben @ 405 nm
Prozesschemikalien
FAQ
Positiv-Photoresiste
UV-Lithographie
Grauton-Lithographie
E-Beam Lithographie
Prozesschemikalien
FAQ
Hybrid Polymers
UV-Lithographie
UV Imprint/ UV Moulding
Herstellung Polymerer Arbeitsstempel
Ink-Jet Printing
Prozesschemikalien
FAQ
Nanoimprint-Resiste
Thermische Nanoimprint-Lithographie
Kombinierte thermische- und Photo-Nanoimprint-Lithographie
Photo-Nanoimprint-Lithographie
Herstellung Polymerer Arbeitsstempel
Prozesschemikalien
FAQ
Produkte anderer Hersteller
DOW Electronic Materials
MicroChem Corp. Produkte
DuPont Trockenfilmresiste